#  Research 

 



##  Formation of 2-DEG Electron Gas 

2-DEG formed at oxide heterostructures for high performance transparent transistors.

 

 

 

       ![gordon_lee_1.png](/sites/g/files/omnuum7801/files/styles/hwp_28_10__1920x685/public/gordon/files/gordon_lee_1_1.png?itok=qOEuBud-) 

 

 



 

 



 

Research in our laboratory centers on thin film deposition. Typically, a compound (the "precursor") is entrained in the vapor phase into a deposition furnace, where it thermally reacts with another species (the "reactant gas") to form a thin film. Target films include thin metal films (e.g., copper, silver), thin conducting films (e.g., WN, F-SnO2), magnetic materials (e.g., Fe2O3), and high-K dielectric materials (e.g., HfO2, ZrO2).  
There are three main branches to this research:

1\. Precursor Design - the precursor materials are specifically designed to have high volatility and thermal reactivity at the furnace temperature. These precursors are typically inorganic or organometallic complexes containing the metal atom component of the target film.

For example, see:  
[Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors](/file_url/100)  
Dennis M. Hausmann, Esther Kim, Jill Becker, and Roy G. Gordon  
Chemistry of Materials (**2002**) 14: 4350-4358

2\. Atomic Layer Deposition - our major focus for thin film depositions is on atomic layer deposition, or ALD. It is a process for depositing thin layers from two or more vapor precursors. The surface onto which film is to be deposited is exposed to a dose of vapor from one precursor; then any excess unreacted vapor from that precursor is pumped away. Next, a vapor dose of the reactant gas is brought to the surface and allowed to react. This cycle of steps can be repeated to build up thicker films.

For example, see:  
[Rapid Vapor Deposition of Highly Conformal Silica Nanolaminates](/file_url/101)  
Dennis Hausmann, Jill Becker, Shenglong Wang, and Roy G.Gordon  
Science (**2002**) 298: 402-406

3\. Theoretical modeling - the deposition of smooth, even films can be difficult on complex surfaces. In particular, when deposition needs to occur in a very deep hole, it can be difficult to have the film evenly coated to the bottom. Our group has determined a theoretical model to describe the depth to which a film can be deposited in a hole, as well as presenting experimental data to verify the model.

For example, see:  
[A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches](/file_url/102)  
Roy G. Gordon, Dennis M. Hausmann, Esther Kim and Joseph Shepard  
Chemical Vapor Deposition (**2003**) 9: 73-78



 

##  Latest News 

 



  [### Xian Gong's Thesis Defense February 23, 2022

 ](/news/xian-gongs-thesis-defense-february-23-2022) June 15, 2022 

 

 

 

   ![Xian defense](/sites/g/files/omnuum7801/files/styles/hwp_16_9__480x270/public/gordon/files/xian_defense_pic_03.jpg?itok=6b2_AGiL) 

 



 

 

   [### Rhino Volleyball with the Aziz and Gordon Groups

 ](/news/rhino-volleyball-aziz-and-gordon-groups) August 04, 2021 

 

 

 

   ![Rhino](/sites/g/files/omnuum7801/files/styles/hwp_16_9__480x270/public/gordon/files/volleyball_4.jpg?itok=W1hG0m-j) 

 



 

 

   [### Harvard students share thoughts on environmental challenges

 ](/news/harvard-students-share-thoughts-environmental-challenges) May 18, 2021 

 Gordon Group Eliza Spear speaks on energy and greenhouse-gas emissions. By Alvin Powell For many, thinking about the world’s environmental future brings concern, even outright alarm. There have been, after all, decades of increasingly strident warnings by... 

 

 

   ![Eliza Spear](/sites/g/files/omnuum7801/files/styles/hwp_16_9__480x270/public/gordon/files/earth_day_03-768x512_-_eliza.jpg?itok=E5-NgHPL) 

 



 

 

   [### Min Wu's Thesis Defense, Congratulations!

 ](/news/min-wus-thesis-defense-congratulations) April 29, 2021 

 

 

 

   ![Min](/sites/g/files/omnuum7801/files/styles/hwp_16_9__480x270/public/gordon/files/min_defense.png?itok=rTcLSYHm) 

 



 

 

   [### A treasured colleague

 ](/news/treasured-colleague) July 15, 2020 

 Harvard honors Professor Roy Gordon's legacy with a new endowed title By Caitlin McDermott-Murphy Roy Gordon can no longer leave Harvard University. Though he will choose to retire and depart at some point in the future, when he does, his name will remain... 

 

 

   ![Roy_office](/sites/g/files/omnuum7801/files/styles/hwp_16_9__480x270/public/gordon/files/roy_gordon_in_his_office_sm.jpg?itok=84Oo6l3A) 

 



 

 

   [### A captain for our planet

 ](/news/captain-our-planet) May 27, 2020 

 How Christina Chang shifted from cold showers to tech development in her quest for a more sustainable world. By Caitlin McDermott-Murphy As a kid, Christina Chang was already a mini-sustainability activist. She recycled and reused. She turned lights off... 

 

 

   ![Christina Chang](/sites/g/files/omnuum7801/files/styles/hwp_16_9__480x270/public/gordon/files/peru_saving_amazon_rain_forest_harvard_course_square.jpg?itok=3WVRt_dd) 

 



 

 

  

 

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