ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone
Publication information:
Liu, Xinye, Sasangan Ramanathan, Ana Longdergan, Anuranjan Srivastava, Eddie Lee, Thomas Seidel, Jeffrey Barton, Dawen Pang, and Roy Gordon. “ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone”. Journal of The Electrochemical Society 152, no. 3 (2005): G213-G219.