Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
Publication information:
Hausmann, Dennis, Esther Kim, Jill Becker, and Roy Gordon. “Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors”. Chemistry of Materials 14, no. 10 (2002): 4350-58.