Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor
Publication information:
Li, Zhengwen, Antti Rahtu, and Roy Gordon. “Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor”. Journal of The Electrochemical Society 153, no. 11 (2006): C787-C794.