Automatic Control of Stoichiometry in CVD of Metal Silicates by Alternating Surface Reactions
Publication information:
Gordon, Roy. “Automatic Control of Stoichiometry in CVD of Metal Silicates by Alternating Surface Reactions”. Electrochemical Society Proceedings 2001-13, no. Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II (2001): 136-43.