Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
Publication information:
Kim, Do-Heyoung, Young Jae Kim, Yo Soon Song, Byung-Teak Lee, Jin Hyeok Kim, Seigi Suh, and Roy Gordon. “Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-Butylimido)bis(dimethylamido)tungsten”. Journal of The Electrochemical Society 150, no. 10 (2003): C740-C744.