Chemical Vapor Deposition (CVD) of Manganese Self-Aligned Diffuson Barriers for Interconnections in Microelectronics
Publication information:
Gordon, Roy, Hoon Kim, Yeung Au, Hongtao Wang, Harish Bhandari, Yiqun Liu, Don Keun Lee, and Youbo Lin. “Chemical Vapor Deposition (CVD) of Manganese Self-Aligned Diffuson Barriers for Interconnections in Microelectronics”. Advanced Metallization Conference 2008 Proceedings, 2009, 321-29.