Diffusion barrier properties of tungsten nitride films grown by atomic layer deposition from bis(tert-butylimido)bis(dimethylamido) tungsten and ammonia
Publication information:
Becker, Jill, and Roy Gordon. “Diffusion Barrier Properties of Tungsten Nitride Films Grown by Atomic Layer Deposition from Bis(tert-Butylimido)bis(dimethylamido) Tungsten and Ammonia”. Applied Physics Letters 82, no. 14 (2003): 2239-41.