Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films
Publication information:
Li, Zhefeng, Roy Gordon, Huazhi Li, Deo Shenai, and Christian Lavoie. “Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films”. Journal of The Electrochemical Society 157, no. 6 (2010): H679-H683.