Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors
Publication information:
Hausmann, Dennis, Philippe Rouffignac, Amethyst Smith, Roy Gordon, and Douwe Monsma. “Highly Conformal Atomic Layer Deposition of Tantalum Oxide Using Alkylamide Precursors”. Thin Solid Films 443, no. 1-2 (2003): 1-4.