New liquid precursors for chemical vapor deposition
Publication information:
Gordon, Roy, Feng Chen, Nicholas Jr. DiCeglie, Amos Kenigsberg, Xinye Liu, Daniel Teff, and John Thornton. “New Liquid Precursors for Chemical Vapor Deposition”. Materials Research Society Symposium Proceedings 495, no. Chemical Aspects of Electronic Ceramics Processing (1998): 63-68.