In-situ FTIR Study of Atomic Layer Deposition (ALD) of Copper Metal Films
Publication information:
Dai, Min, Jinhee Kwon, Erik Langereis, Leszek Wielunski, Yves Chabal, Zhengwen Li, and Roy Gordon. “In-Situ FTIR Study of Atomic Layer Deposition (ALD) of Copper Metal Films”. ECS Transactions 11, no. 7 (2007): 91-101.