Smooth, Low-Resistance, Pinhole-Free, Conformal Ruthenium Films by Pulsed Chemical Vapor Deposition
Publication information:
Wang, Xinwei, and Roy Gordon. “Smooth, Low-Resistance, Pinhole-Free, Conformal Ruthenium Films by Pulsed Chemical Vapor Deposition”. ECS Journal of Solid State Science and Technology 2, no. 3 (2013): N41-N44.