Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
Publication information:
Hausmann, Dennis, and Roy Gordon. “Surface Morphology and Crystallinity Control in the Atomic Layer Deposition (ALD) of Hafnium and Zirconium Oxide Thin Films”. Journal of Crystal Growth 249, no. 1-2 (2003): 251-61.