Volatile liquid precursors for the chemical vapor deposition (CVD) of thin films containing tungsten
Publication information:
Gordon, Roy, Sean Barry, Randy Broomhall-Dillard, Valerie Wagner, and Ying Wang. “Volatile Liquid Precursors for the Chemical Vapor Deposition (CVD) of Thin Films Containing Tungsten”. Materials Research Society Symposium Proceedings 612, no. Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics (2000): D9.12/1-D9.12/6.