Volatile liquid precursors for the chemical vapor deposition (CVD) of thin films containing alkali metals
Publication information:
Broomhall-Dillard, Randy, Roy Gordon, and Valerie Wagner. “Volatile Liquid Precursors for the Chemical Vapor Deposition (CVD) of Thin Films Containing Alkali Metals”. Materials Research Society Symposium Proceedings 606, no. Chemical Processing of Dielectrics, Insulators and Electronic Ceramics (2000): 139-45.